Researchers develop new process for low-cost graphene production

A team of researchers from the Institute for Plasmas and Nuclear Fusion (IPFN), Instituto Superior Técnico, have reported a new process to fabricate free-standing graphene using plasma technology, at much lower production cost than the other existing market solutions.

The invention was granted the first international patent on the “Process, reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology” (ref. US 11254575B2), by the US Patent Office.