Adisyn reports advancement in low-temperature graphene production

Adisyn has reportedly taken a step toward solving one of the semiconductor industry’s most stubborn problems, advancing low-temperature graphene production.

Adisyn has deposited a continuous graphene layer across a 1cm by 1cm surface using an industrial Atomic Layer Deposition (ALD) system – at temperatures well below the semiconductor industry’s thermal ceiling of around 450°C. Advanced imaging and testing have confirmed that the graphene forms a continuous layer across the entire surface, a critical requirement for use in semiconductor chips.

Adisyn has reportedly taken a step toward solving one of the semiconductor industry’s most stubborn problems, advancing low-temperature graphene production.Adisyn has deposited a continuous graphene layer across a 1cm by 1cm surface using an industrial Atomic Layer Deposition (ALD) system – at temperatures well below the semiconductor industry’s thermal ceiling of around 450°C. Advanced imaging and testing have confirmed that the graphene forms a continuous layer across the entire surface, a critical requirement for use in semiconductor chips.

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