Venture firm Global Brain has led a new funding round in AirMembrane, a Japanese developer and manufacturer of graphene pellicles for extreme ultraviolet (EUV) lithography. Global Brain invested through its Global Brain Flagship Fund IX. The TAKANAWA GATEWAY Global Co-Benefits Fund joined the round for the first time, and the Shinhan-GB FutureFlow Fund made a follow-on investment.
EUV pellicles are protective films that shield photomasks from particle contamination during chipmaking, and they have a significant effect on semiconductor yield. As the industry moves toward next-generation High-NA EUV lithography, a pellicle has to combine high transmittance, heat dissipation, chemical stability and mechanical strength, which is a known engineering problem.
Venture firm Global Brain has led a new funding round in AirMembrane, a Japanese developer and manufacturer of graphene pellicles for extreme ultraviolet (EUV) lithography. Global Brain invested through its Global Brain Flagship Fund IX. The TAKANAWA GATEWAY Global Co-Benefits Fund joined the round for the first time, and the Shinhan-GB FutureFlow Fund made a follow-on investment.EUV pellicles are protective films that shield photomasks from particle contamination during chipmaking, and they have a significant effect on semiconductor yield. As the industry moves toward next-generation High-NA EUV lithography, a pellicle has to combine high transmittance, heat dissipation, chemical stability and mechanical strength, which is a known engineering problem.
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