Adisyn confirms graphene deposition across a full 200mm wafer, ~300x its previous coupon-scale result

The deposition was tested at 12 sampling locations across the wafer and worked at all of them, covering an area roughly 300 times larger than that earlier coupon-level result. The low-temperature deposition, below 300°C, is significant because most existing semiconductor fabrication processes cannot tolerate the higher temperatures that traditional graphene growth methods typically require.

Adisyn has independently confirmed it can deposit graphene across a full 200mm industrial wafer at low temperature, below 300°C – a scale-up from the 1cm by 1cm coupon the company had previously demonstrated.The deposition was tested at 12 sampling locations across the wafer and worked at all of them, covering an area roughly 300 times larger than that earlier coupon-level result. The low-temperature deposition, below 300°C, is significant because most existing semiconductor fabrication processes cannot tolerate the higher temperatures that traditional graphene growth methods typically require.

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